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K. Kuribara, T. Nakagawa, K. Fukuda, T. Yokota, T. Sekitani, U. Zschieschang, H. Klauk, T. Yamamoto, K. Takimiya, and T. Someya, "Oxygen Plasma Process of Self-Assembled Monolayer Gate Dielectric for 2-V Operation High-Mobility Organic Tft," 2011 International Conference on Solid State Devices and Materials (SSDM 2011), September 2011.
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| ID |
836 |
| 分類 |
国際会議（一般講演：口頭） |
| タグ |
2-v dielectric gate high-mobility monolayer operation organic oxygen plasma process self-assembled tft |
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表題 (title)
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Oxygen Plasma Process of Self-Assembled Monolayer Gate Dielectric for 2-V Operation High-Mobility Organic Tft
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表題 (英文)
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著者名 (author)
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Kazunori Kuribara, Takashi Nakagawa, Kenjiro Fukuda, Tomoyuki Yokota, Tsuyoshi Sekitani, Ute Zschieschang, Hagen Klauk, Tatsuya Yamamoto, Kazuo Takimiya, Takao Someya
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英文著者名 (author)
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Kazunori Kuribara,Takashi Nakagawa,Kenjiro Fukuda,Tomoyuki Yokota,Tsuyoshi Sekitani,Ute Zschieschang,Hagen Klauk,Tatsuya Yamamoto,Kazuo Takimiya,Takao Someya
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キー (key)
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Kazunori Kuribara,Takashi Nakagawa,Kenjiro Fukuda,Tomoyuki Yokota,Tsuyoshi Sekitani,Ute Zschieschang,Hagen Klauk,Tatsuya Yamamoto,Kazuo Takimiya,Takao Someya
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定期刊行物名 (journal)
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2011 International Conference on Solid State Devices and Materials (SSDM 2011)
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定期刊行物名 (英文)
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巻数 (volume)
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号数 (number)
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ページ範囲 (pages)
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刊行月 (month)
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9
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出版年 (year)
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2011
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Impact Factor (JCR)
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URL
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付加情報 (note)
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注釈 (annote)
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内容梗概 (abstract)
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Aichi Industry & Labor Center (WINC AICHI), Nagoya, Japan, September 28-30, 2011.
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| 論文電子ファイル |
利用できません．
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| BiBTeXエントリ |
@article{id836,
title = {Oxygen Plasma Process of Self-Assembled Monolayer Gate Dielectric for 2-V Operation High-Mobility Organic TFT},
author = {Kazunori Kuribara and Takashi Nakagawa and Kenjiro Fukuda and Tomoyuki Yokota and Tsuyoshi Sekitani and Ute Zschieschang and Hagen Klauk and Tatsuya Yamamoto and Kazuo Takimiya and Takao Someya},
journal = {2011 International Conference on Solid State Devices and Materials (SSDM 2011)},
month = {9},
year = {2011},
}
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